陳弘穎 教授 兼 副系主任
- 系所：化學工程與材料工程系
- 研發領域：化學工程及製程
- 標籤： 材料科技,化學工程,電化學與能源科技
- 專長： 透明導電氧化物薄膜,薄膜氧化與相變化,薄膜機械性質
- 學歷：
國立中興大學材料工程博士
- 經歷：
- 電話：07-381-4526#15130
- 傳真：07-383-0674
1
常壓電漿轟擊碳鋼滲硫鎳氮之研究Study on Permeation of S-Ni-N in Carbon Steel Bombarded by Atmospheric Pressure Plasma
2
以常壓電漿製程製備摻雜銀之黑色二氧化鈦薄膜及特性分析Preparation and characterization of Ag doped black titanium dioxide films with atmospheric pressure plasma process
3
以常壓電漿製程進行鋯基材表面氮化及其特性分析Nitriding of zirconium substrate with atmospheric pressure plasma process
4
以大氣常壓電漿製程製備氮化鐵薄膜Preparation of Iron nitride Films using Atmospheric Pressure Plasma Process
5
赤銅鐵礦相 CuCr1-xFe xO2(x = 0 , 0.2 , 0.5) 薄膜的製備及其特性分析Preparation and Characterization of Delafossite CuCr1-xFexO2 (x = 0 , 0.2 , 0.5) Films
6
大氣電漿氮化鈦基材之研究Nitridation of titanium substrate with atmospheric pressure plasma processing
7
以大氣電漿製程製備黑色二氧化鈦薄膜及其特性分析Preparation and Characterization of Black Titanium Dioxide Films with Atmospheric Pressure Plasma Process
8
以常壓電漿製程在鋁合金表面製備氮化鋁薄膜之研究Preparation of Aluminum Nitride Thin Film on Aluminum Alloy by Atmospheric Pressure Plasma Process
9
以溶膠-凝膠法製備ZnCo2O4薄膜於FTO之研究Preparation of ZnCo2O4 thin film on FTO substrate by sol-gel processing
10
以常壓電漿製程製備三元氮化鋁鉻薄膜及其特性分析Preparation and Characterization of Ternary Chromium Aluminum Nitride Films with Atmospheric Pressure Plasma Process
11
Preparation of CuMnO2 Thin Films under Controlled Atmosphere at High Temperature
12
以常壓電漿製程製備碳化鉻粉末Preparation of chromium carbide powders using atmospheric pressure plasma process
13
常壓電漿成長氮化矽薄膜之研究Silicon nitride thin films prepared using atmospheric pressure plasma
14
以溶膠凝膠法製備摻雜Li及Mg的ZnCo2O4 薄膜及其特性分析The Characterization of ZnCo2O4 Thin Films Doped with Li and Mg Using Sol-gel Process
15
以常壓電漿製程製備氮化鉻薄膜Preparation of chromium nitride thin films using atmospheric pressure plasma process
16
以溶膠凝膠法製備Ni摻雜的ZnCo2O4薄膜與其光電特性研究Preparation of sol-gel derived Ni-doped ZnCo2O4 thin films and their optoelectronic properties
17
開發一種可攜式的大氣電漿系統Development of a portable atmospheric pressure plasma system