顏志峰 副教授
- 系所：半導體工程系
- 研發領域：電機與電子工程,其他工程及工程業
- 標籤： 光電材料與 太陽能電池,半導體
- 專長： 金氧半元件製程與分析,化合物半導體,太陽能電池
- 學歷：
國立中山大學電機工程研究所博士
- 經歷：
聯銓光電1年8個月
- 電話：(07)381-4526#23374
- 傳真：(07)364-5589
1
半導體切割製程之正崩改善及磨刀參數最佳化研究Research on the improvement of chipping and optimization of sharpening parameters in semiconductor dicing saw process
2
以兩步法非真空製程製備具有高降解效率之多孔氧化鋅奈米柱及其性能探討並應用於光催化之研究Fabrication and properties of porous ZnO nanorods with high degradation efficiency by 2-step non-vacuum process and their applications on photocatalytic
3
以溶膠-凝膠法製備摻雜鋯和表面活性劑的高性能新型氧化鈰閘極氧化層之特性研究The high performance of novel CeO2 gate oxide doped with Zr and surfactant prepared by sol-gel method on Si MOS
4
以低溫製程製備氧化鋅/莫來石陶瓷閘極氧化層及其高品質電特性之研究Investigation of ZnO/mullite ceramic gate oxide layer by low-temperature process and its highquality electrical characteristics
5
探討毫米波雷達測試製程的清潔方法對良率之影響Study the yield impact of cleaning methods for millimeter wave radar test procedures
6
晶圓上膜製程之邊緣膠絲探討與改進Discussion and Improvement of Edge Glue Wire in Wafer Taping
7
運用 HPL 參數調整對記憶體模組可靠度與品質之研究The study of High Performance Linpack parameter adjustment on the reliability of memory module
8
以溶膠凝膠法製備新穎氧化鋁/氧化鋅複合薄膜及其電性探討Preparation of Novel Alumina/ZnO Composite Thin Films by Sol-Gel Method and Discussion on Its Electrical Properties
9
晶背研磨介紹及刻痕改善Introduction of Back Grinding and Scratch Improvement
10
工廠自動化系統應用於製程檢驗之效益分析與探討Benefit analysis and discussion on the application of factory automation system to process inspection
11
添加微量元素對無鉛錫球與鍍錫基板結合能力之評估Evaluation of the combination ability of solder balls to IT substrates by adding trace elements
12
以溶膠-凝膠法製備高性能錳摻雜乙酰丙酮鋯為金氧半結構閘極層及其電學與化學特性分析High-performance sol-gel deposited ZrAcac mixed Mn thin films as gate dielectric for MOS technology and their analysis of electrical and chemical characteristics
13
以氧化釔摻雜二氧化鉿鐵電薄膜：於MOS和MIM電容器的沉積製程、特性、物理與應用Y2O3-doped HfO2 ferroelectric films: deposition process, characterization, physics and applications on MOS and MIM-capacitors
14
陰影雲紋干涉儀對小型化構裝產品翹曲變化之研究Research on the warpage change of the small out-line package by the shadow moiré
15
具理想電容電壓特性曲線與低漏電流之氧化釔摻雜氧化鋅高介電係數介電層研製Development of high-k yttrium oxide-doped zinc oxide layer with ideal capacitance-voltage characteristics and low leakage current
16
以非真空技術於矽基板上製備具良好介電品質氮氧化矽薄膜之研究Research on High Dielectric Quality SiON Film on Silicon Substrate by Non-Vacuum Technology
17
具極低表面粗糙度之高性能新穎氧化鋁：氧化鋅薄膜製備Preparation of a novel high-performance aluminum oxide doped zinc oxide film with extremely low surface roughness
18
以液相沉積法備製具有低漏電流及高介電常數之新穎釓摻雜二氧化鉿/矽金氧半結構Fabrication of Novel Gd-doped HfO2/Si MOS by Liquid Phase Deposition with Low Leakage Current and High Dielectric Constant
19
以液相沉積法製備二氧化鋯/氧化鋁閘極氧化層堆疊之電特性研究Electrical Characteristics of ZrO2/Al2O3 Gate Oxide Stacks by Liquid Phase Deposition
20
以氧化鎂/氧化鈦為閘極介電層之矽金氧半電容器特性改善及其載子傳輸之探討Improved Performance of MgO/TiO2 Gate Dielectric on Si MOS Capacitors and Their Carrier Transportation Characterizations
21
TFT-LCD雷射CVD修補斷線之材料阻抗研究Study of TFT-LCD LCVD Repair Source Material Resistance
22
具低界面狀態密度之高品質氧化鋁/矽金氧半電容器電特性研究Electrical Characteristics of High Quality Al2O3/Si MOS Capacitor with Low Density of Interface States